Sputtering targets

MBN Nanomaterialia develops and manufactures composite powders using its proprietary High Energy Ball Milling (HEBM) technology, enabling the design of advanced materials for sputtering targets, powder metallurgy, and thermal spray applications.

HEBM allows the solid-state dispersion of elemental materials with vastly different melting points, avoiding full alloying or unwanted intermetallic phases. The result is a customizable powder composition, often involving three or more elements, engineered for specific application requirements.

Key benefits of HEBM powders:
◉ Ultra-fine dispersion of phases at nano to submicron scale
◉ Custom formulations beyond conventional alloying limits
◉ High purity materials (up to 4N grade) processed in inert atmosphere and lined reactors (Ti, Ni, Cu, Fe systems)

Available compositions include:
• WNiCr, WNi, WCu, WMo, WTi
• NiCuSi, NiCuCr, FeNi
• TiAl, ZnTi

Powders are available in tailored particle size distributions suitable for producing rotary sputtering targets with controlled microstructures and optimized performance.