Sputtering targets

Composite powders  developed and designed  for advanced materials for sputtering targets, powder metallurgy, and thermal spray applications.

 

HEBM allows the solid-state dispersion of elemental materials with vastly different melting points, avoiding full alloying or unwanted intermetallic phases. The result is a customizable powder composition, often involving 3 or more elements, engineered for specific application requirements.

Key benefits of HEBM powders:
◉ Ultra-fine dispersion of phases at nano to submicron scale
◉ Custom formulations beyond conventional alloying limits
◉ High purity materials (up to 4N grade) processed in inert atmosphere and lined reactors (Ti, Ni, Cu, Fe systems)

 

Available compositions include:
• WNiCr, WNi, WCu, WMo, WTi
• NiCuSi, NiCuCr, FeNi
• TiAl, ZnTi

Powders are available in tailored particle size distributions suitable for producing rotary sputtering targets with controlled microstructures and optimized performance.

Compositions
W Ni W Ni Cr W Mo W Ti Ni Cu Cr Ti Al Zn Ti
Particle Size Distribution
Process Typical size μm
HVOF 10-45
HVAF 5-38
CGS 10-38
APS 20-106